MX61L/ MX61The MX61L/ MX61, 300 mm/ 200 mm semiconductor inspection microscope provides exceptional image resolution and clarity through observation methods such as brightfield, darkfield, differential interference contrast (DIC), fluorescence and infrared.
Описание:Ergonomic Design FeaturesIntuitive Controls for Faster OperationFront Panel [1] Illumination Intensity Knob [2] Rotation for the Objective Lens Turret [3] Aperture Stop Adjustment The key controls of the MX61L/ MX61 are positioned at the operator's fingertips at the front of the microscope, near the focusing knobs. The objectives, illumination intensity and aperture can all be adjusted without the operator taking their eyes away from the eyepieces or removing their hands from the focusing knobs.
Titling Trinocular Observation TubeTilting Observation Tube The extensive range of the tilting observation tube allows the operator to sit at the microscope using the proper posture ensuring reliable and comfortable operation.
Clutch Driven Manual XY StageStage handle with built-in clutch The 300mm manual XY stage is capable of both coarse and fine stage movements by using the built-in clutch mechanism and XY knobs. Using the clutch, the operator can freely move the stage while performing inspections.
Excellent Image Clarity and Superb ResolutionWide Choice for Superior Imaging PerformanceThe objective is the core part of the optical microscope, used for the illumination and observation of material science samples. Olympus has the widest choice of objectives, universal objectives suitable for all contrast methods, long and ultra long working distance objectives, near-infrared objectives, LCD inspection objectives and many more. Example Observation Images
Brightfield Darkfield DIC Fluorescence
> Click here for details about UIS2 objective lenses Software SolutionsReady for Digital ImagingThe MX61L/ MX61 is equipped with a PC interface for control of the microscope. Objective magnifications can be automatically stored while capturing images. This guarantees reliable image information for further processing and analysis. Digital Imaging, Image Analysis and Database ManagementOlympus offers a wide range of imaging and analysis solutions including a variety of digital cameras as well as software. Our most advanced software, integrates with the Olympus MX61L/ MX61 and performs mission-critical tasks such as image acquisition, specialized image processing, measurement functions, statistical outputs, annotation, archiving, report generation and database management including an optional Secure File Repository for added security. > Click here for Olympus' lineup of digital cameras
High Performance FeaturesIncreased Inspection Speed with Motorized NosepiecesMotorized Revolving Nosepiece The rotational speed of the motorized nosepieces are ultra-fast, decreasing time between inspections while maintaining clean room compatibility. Olympus offers three variations for desired inspection methods controlled via software, frame button or independent handset.
Optimized Contrast by Automatic Aperture ControlAutomatic Aperture Stop Control The integrated motorized aperture stop automatically adjusts for the objective lens in use. Thus the best image quality for every magnification is achieved, making routine inspections more comfortable for the eyes and more efficient for the operator.
Accessories Supporting Diverse Observation MethodsSeamless Integration with Olympus Wafer HandlersAL120 Wafer Handler and MX61L Semiconductor Inspection Microscope The MX61L/ MX61 is perfectly suited to interface with the Olympus AL series of wafer handlers for fast and efficient wafer transfer for 100-200mm wafers. Compatible with most substrates, the AL120 wafer handlers now transfer wafers as small as 90um in thickness. Macro wafer inspection is available on board with the ability to view the entire rear surface of the wafer without manual intervention. Coupling the AL series to the MX61L/ MX61 provides fast cassette-to-cassette operation, minimizing the chance of accidental damage to the wafer.
*AL120 may not be available in some area. Near-infrared (IR) Optics and ImagingThe specially designed IR objective lenses and components are ideal for imaging features and defects beneath the surface of silicon and glass. The Semiconductor and Photovoltaic industries use IR imaging for alignment, identification of sub-surface contamination and critical dimension inspections. The 20x, 50x and 100x objectives are designed with a correction collar that corrects for the aberrations caused by the thickness of silicon and glass, improving overall contrast. Olympus supports several IR digital cameras for near infrared imaging and analysis. Near-infrared Components Near-infrared Observation Fluorescence ObservationThe MX61L/ MX61 can be equipped with fluorescence observation by adding a mirror cube and high intensity light source. Fluorescence observation is ideal for easy detection of resist residuals and organic particles. Fluorescence Mirror Cubes Fluorescence Observation Transmitted Light ModuleTransmitted Light Module Transmitted light can be added to the MX61L/ MX61 for photo-mask or flat panel display inspections. Two types are available, one with a universal condenser and a second type with a high numerical aperture. Both support simple polarized light. Transmitted light can be added to the MX61 for photo-mask or flat panel display inspections. Two types are available, one with a universal condenser, MX-TILLA, and a second type with a high numerical aperture, MX-TILLB. Both support simple polarized light.
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